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Teach Yourself the Basics of Aspen Plus - 2nd Edition by Ralph Schefflan (Paperback)

Teach Yourself the Basics of Aspen Plus - 2nd Edition by  Ralph Schefflan (Paperback) - 1 of 1
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About this item

Highlights

  • Aspen Plus is one of the most popular process simulation software programs used industrially and academically.
  • About the Author: Ralph Schefflan has been an adjunct professor at Stevens Institute of Technology for the past thirty-five years.
  • 280 Pages
  • Technology, Chemical & Biochemical

Description



Book Synopsis



Aspen Plus is one of the most popular process simulation software programs used industrially and academically. The book is designed to enable chemical engineers to go through a step-by-step process of learning the basic ideas underlying chemical process simulation, by studying the primary functions of the Aspen Plus software. Because of the major changes Aspen Technology has made in the user's interface in release 8.x, parts of the first edition which is based on release 7.x have become obsolete. However much of the scientific and engineering material has not changed; for example the material describing the distillation modules is completely suitable for self-study however some of the displays have changed. New chapters include Equation-Oriented Simulation, Electrolytes, and an appendix on The NIST Thermo Data Engine as a data source.

Each chapter starts with the equivalent of a classroom lecture followed by workshops which provide experience in the chapter's subject matter. The downloadable files contain solutions, both in Aspen Plus and text formats, to examples imbedded in the text as well as to all the workshops. There are also notes at the end of each chapter designed to aid readers that have difficulty with the workshops.



From the Back Cover



The complete step-by-step guide to mastering the basics of Aspen Plus software

Used for a wide variety of important scientific tasks, Aspen Plus software is a modeling tool used for conceptual design, optimization, and performance monitoring of chemical processes. After more than twenty years, it remains one of the most popular and powerful chemical engineering programs used both industrially and academically.

Teach Yourself the Basics of Aspen Plus, Second Edition continues to deliver important fundamentals on using Aspen Plus software. The new edition focuses on the newest version of Aspen Plus and covers the newest functionalities. Lecture-style chapters set the tone for maximizing the learning experience by presenting material in a manner that emulates an actual workshop classroom environment. Important points are emphasized through encouragement of hands-on learning techniques that direct learners toward achievement in creating effective designs fluidly and with confidence. Teach Yourself the Basics of Aspen Plus, Second Edition includes:

  • Examples embedded within the text to focus the reader on specific aspects of the material being covered
  • Workshops at the end of each chapter that provide opportunities to test the reader's knowledge in that chapter's subject matter
  • Functionalities covered in the newest version of Aspen including the solution of a flowsheet by an equation oriented, EO approach, and the solution of problems which involve electrolyte equilibria
  • Aspen Plus executable format as well as .txt format files containing details of the examples and the workshops as well as their solutions are provided as a download

Designed with both students and professionals in mind, Teach Yourself the Basics of Aspen Plus, Second Edition is like having a personal professor 24/7. Its revolutionary format is an exciting way to learn how to operate this highly sophisticated software--and a surefire way for readers to get the results they expect.



About the Author



Ralph Schefflan has been an adjunct professor at Stevens Institute of Technology for the past thirty-five years. He has taught four graduate courses, thermodynamics, process simulation, numerical methods, and equilibrium stage operations during his time there as well as being SIT's representative to Aspen Technology. Dr. Schefflan introduced process simulation at SIT evolving from Flowtran to Aspen Plus and taught it for thirty years.

Dimensions (Overall): 9.9 Inches (H) x 7.0 Inches (W) x .6 Inches (D)
Weight: 1.15 Pounds
Suggested Age: 22 Years and Up
Sub-Genre: Chemical & Biochemical
Genre: Technology
Number of Pages: 280
Publisher: Wiley-Aiche
Format: Paperback
Author: Ralph Schefflan
Language: English
Street Date: September 26, 2016
TCIN: 89111163
UPC: 9781118980590
Item Number (DPCI): 247-07-3764
Origin: Made in the USA or Imported
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Shipping details

Estimated ship dimensions: 0.6 inches length x 7 inches width x 9.9 inches height
Estimated ship weight: 1.15 pounds
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